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溅射软磁金属薄膜的微波阻尼调控

时间:2019-01-24 22:19来源:毕业论文
利用高真空磁控溅射平台通过倾斜溅射技术制作了一系列FeCoDyAlO样品,通过VSM对磁滞回线进行了研究,并运用矢量网络分析仪器对样品的磁谱进行了研究

摘要软磁金属薄膜的阻尼调控一直是高频材料研究热点。本文本文利用高真空磁控溅射平台通过倾斜溅射技术制作了一系列FeCoDyAlO样品,通过VSM对磁滞回线进行了研究,并运用矢量网络分析仪器对样品的磁谱进行了研究。33028
    通过研究我们发现:
(1) 利用倾斜溅射一方面可以有效提高软磁金属薄膜的各向异性,另一方面随着倾斜溅射角度的增大,薄膜的矫顽力也随着增大,因此选择合适的倾斜溅射角度有利于提高薄膜的软磁性能。
(2) 利用倾斜溅射技术可以调节共振线宽 和共振频率fr,随着倾斜溅射角度变化,共振线宽和共振频率都会在不同的频率下达到最大值。
(3) 通过倾斜溅射技术可以有效的调节微波阻尼,当倾斜溅射角度增大时,阻尼系数呈现非单调变化,在某个合适的角度时,阻尼系数会达到最大。当倾斜溅射角度为35°时,薄膜的阻尼达到最大值。
关键词  软磁薄膜 磁控溅射 倾斜溅射 阻尼
毕业论文设计说明书外文摘要
Title  Tuning the microwave damping of sputtered soft metal thin film
Abstract
Tuning damping of soft metal film is always high frequency materials research focus. In this paper, a high vacuum magnetron sputtering platform by oblique sputtering techniques produced a series FeCoDyAlO samples, by VSM of hysteresis loops were studied, and the use of the vector network analysis instrument magnetic spectra of the samples were studied.
  Through research we found:
 (1) The use of oblique sputtering on the one hand can effectively improve the anisotropy of the soft magnetic metal thin film, on the other hand with the oblique sputtering angle increases, the coercivity of the film along with the increases, so choosing the right tilt splash exit angle will help improve the soft magnetic properties of the film.
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(2) The use of sputtering techniques can adjust the inclination resonance linewidth and resonance frequency fr. With oblique sputtering angle variation, the resonance linewidth and the resonant frequency reache a maximum at different frequencies.
(3) By tilting the sputtering technique can effectively regulate the microwave damping, when the tilt angle of the sputtering increases, damping rendered non-monotonic, in a right angle, the damping will be maximized.  When the tilt angle of 35°, the film reaches a maximum damping.
Keywords  Soft magnetic thin film   Magnetron sputtering   Oblique sputtering  Damping
目   次
1  绪论    1
1.1引文    1
1.2软磁金属薄膜    1
1.2.1单层金属薄膜    1
1.2.2多层复合薄膜    2
1.3软磁金属薄膜的重要参数和理论    2
1.4 软磁材料动态磁化过程    5
1.4.1动态磁化曲线    5
1.4.2 动态磁化参数    6
1.5 磁化强度进动和阻尼的基本概念    7
1.6 选题目的以及研究内容    8
2  实验材料的制备和研究方法    10
2.1 前期工作    10
2.2实验样品的制备与设计    10
2.3磁控溅射技术    12
2.3.1磁控溅射原理    12
2.3.2磁控溅射设备介绍    12
2.4振动样品磁强计(VSM)    13
2.5 矢量网络分析仪    14
3 倾斜溅射对FeCoDyAlO阻尼的影响    16
3.1  FeCoDyAlO静态磁性能表征    16
3.1.1薄膜体系制备    16
3.1.2磁滞回线分析    16
3.2 FeCoDyAlO薄膜动态磁性能分析    18 溅射软磁金属薄膜的微波阻尼调控:http://www.lwfree.cn/cailiao/20190124/29875.html
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