毕业论文

当前位置: 毕业论文 > 化学论文 >

激光复合薄膜换能元的制备与表征技术

时间:2017-08-12 14:56来源:毕业论文
利用激光共聚焦显微镜获得了在一定试验参数下各材料的单层薄膜厚度,计算得到材料的沉积速率。设计了各层薄膜的厚度,确定了相应靶材的溅射时间,利用射频磁控溅射仪在K9玻璃基
摘要本文通过磁控溅射方法制备了激光复合换能元所需的多种复合薄膜。首先利用激光共聚焦显微镜获得了在一定试验参数下各材料的单层薄膜厚度,计算得到材料的沉积速率。设计了各层薄膜的厚度,确定了相应靶材的溅射时间,利用射频磁控溅射仪在K9玻璃基底上制备了Al单层膜、C/Al复合薄膜和C/MnO2/Al、C/CuO/Al、C/TiO2/Al等含能复合薄膜。用激光光谱仪测试得到了波长为532nm和1064nm时各种薄膜的反射率:各种薄膜激光反射率都较小,均低于35%;对于同种薄膜在532nm波长下的激光反射率均比1064nm波长的小。用原子力显微镜(AFM)观察了各种薄膜的表面结构致密,均匀性好。12369
关键词:激光驱动,复合薄膜,磁控溅射,表征
毕业设计说明书(论文)外文摘要
Title  Preparation and Characterization on the Laser Coextruded
Thin Film Transducer Component                  
Abstract
  In this paper, C, Al, CuO, MnO2, TiO2 single thin-film on the K9 glass substrate were successfully deposited with magnetron sputtering process. First, The thickness of the monolayer films of various materials was tested with laser scanning confocal microscopy in a certain test parameters, the sputtering rate of the target materials in certain of the sputtering parameters were obtained. After designing thickness of Coextruded Films with the magnetron sputtering rate, C-Al complex films, C-CuO-Al, C-MnO2-Al C-TiO2-Al reactive multi layer films on the K9 glass substrate were deposited with magnetron sputtering process. The reflectance of the different wavelength laser irradiation were tested by using lasers spectrometer in the wavelength of 532nm and 1064nm, The result showed that a variety of thin-film laser reflectivity are small, less than 35%. For the same film in the 532 nm wavelength of laser reflectivity are better than 1064 nm wavelength of small. The surface using atomic force microscopy (AFM), uniformity of the film surface was observed and the results showed that the surface of the films was good uniform, compact.

源自六/维"论\文|网.加7位QQ3249"114 www.lwfree.cn


Keywords: laser ignition Coextruded Film Magnetron sputtering representation.
 目次
1  绪论    1
1.1  激光点火(起爆)技术概况    1
1.2  激光点火介质效应研究现状    2
1.3  激光薄膜换能元    3
1.4  本论文主要工作    5
2  激光复合换能元的制备    7
2.1 实验设备    7
2.2  磁控溅射原理    7
2.3  实验材料    8
2.4实验流程    8
2.5  制备薄膜的参数    9
3  激光复合换能元的表征    12
3.1  薄膜反射率    12
3.2  薄膜的表面形貌表征    15
3.3  小结    18
4  总结与展望    20
4.1总结    20
4.2展望    20
结  论    21
致  谢    22
参 考 文 献    23
1  绪论
1.1  激光点火(起爆)技术概况
激光点火技术就是利用激光能对含能材料进行起爆或点燃的技术。激光点火技术的研究起始于20世纪60年代,现在作为火工烟火技术领域的最新应用技术之一,已经广泛受到人们的重视。激光点火是一种安全、可靠、轻便的新型点火技术,与常规的电桥丝雷管点火相比,其优点[1]:
(1)激光火工品中无桥丝和脚线,从而极大地降低静电放电、射频以及杂散电流等意外点火源引起的点火;
(2)由于激光输出能量的大幅提高,利用激光起爆技术实现钝感炸药由爆燃转爆轰,在传爆序列中除去敏感的起爆药,从而提高点火系统的安全性; 激光复合薄膜换能元的制备与表征技术:http://www.lwfree.cn/huaxue/20170812/12114.html
------分隔线----------------------------
推荐内容